您的位置:
網(wǎng)站首頁(yè) > 產(chǎn)品與服務(wù) > 產(chǎn)品展示 > 集成電路裝備
Semicore Horizon-T 150/200 兼容設(shè)備 CMP
產(chǎn)品型號(hào):Semicore Skylens CMP
產(chǎn)品簡(jiǎn)介:1. Architecture
3 platens, 4 head
2 brushes enhance cleaner effective
High WPH
2. Process
滿足特殊工藝以及三代半導(dǎo)體需求(WIW&WTW<5%)
干進(jìn)干出工藝,降低wafer二次沾染
3. Advanced Process Control
I-scan/Laser/Motor torque
應(yīng)用領(lǐng)域:應(yīng)用于IC制造、STI,ILD,contactor,metal line、BCD,IGBT,5G芯片制造中的平坦化工藝,滿足特殊工藝以及三代半導(dǎo)體需求(碳化硅等)
核心參數(shù):一、Semicore Horizon-T 200CMP
Oxide 運(yùn)行指標(biāo)
1. Hardware criteria
WPH:45
MTBF:>200hrs
MTTR:<3.5hrs
2. Process basic criteria
Removal rate NU(5mm EE):<3%(mean)&<5%(max)
Head to Head RR Range:≤200A/min
二、Semicore Horizon-T 200CMP
W 運(yùn)行指標(biāo)
1. Hardware criteria
WPH:35
MTBF:>200hrs
MTTR:<3.5hrs
2. Process basic criteria
Removal rate NU(5mm EE):<3%(mean)&<5%(max)
Head to Head RR Range:≤300A/min
三、Semicore Horizon-T 150CMP
Oxide 運(yùn)行指標(biāo)
1. Hardware criteria
WPH:45
MTBF:>200hrs
MTTR:<3.5hrs
2. Process basic criteria
Removal rate NU(5mm EE):<8%
Head to Head RR Range:≤200A/min
四、Semicore Horizon-T 150CMP
W 運(yùn)行指標(biāo)
1. Hardware criteria
WPH:35
MTBF:>200hrs
MTTR:<3.5hrs
2. Process basic criteria
Removal rate NU(5mm EE):<8%
Head to Head RR Range:≤300A/min
聯(lián)系人:李巖 聯(lián)系方式:18515063073